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Wave optics simulation of surface roughness for integrated photonics fabricated through multi-photon lithography

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Elisavet Chatzizyrli
  • Alexandra Rittmeier
  • Sophie Böse
  • Jörg Neumann
  • Dietmar Kracht

External Research Organisations

  • Laser Zentrum Hannover e.V. (LZH)

Details

Original languageEnglish
Title of host publicationIntegrated Optics
Subtitle of host publicationDevices, Materials, and Technologies XXIX
EditorsSonia M. Garcia-Blanco, Pavel Cheben
PublisherSPIE
Chapter5
ISBN (electronic)9781510684867
Publication statusPublished - 19 Mar 2025
EventSPIE Photonics West OPTO 2025 - San Francisco, United States, San Francisco, United States
Duration: 25 Jan 202531 Jan 2025

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume13369
ISSN (Print)0277-786X
ISSN (electronic)1996-756X

Abstract

Integrated photonics has the potential to revolutionize telecommunications and computing as electronic circuits approach their physical limits. This study investigates multi-photon lithography (MPL), an innovative method for fabricating photonic integrated circuits, which combines rapid manufacturability with design flexibility but can introduce surface roughness influenced by process parameters. Using ridge waveguides on the photopolymer-on-glass (PoG) platform, surface roughness metrics from laser scanning confocal microscopy (LSCM) and wave optics simulations in ANSYS Lumerical are analyzed. Statistical analysis links process parameters to surface quality, while simulations quantify the impact of roughness on waveguide performance, including scattering-induced losses. This approach facilitates fabrication optimization and enables accurate modeling of 3D-printed photonic components.

Keywords

    integrated photonics, multi-photon lithography, regression analysis, statistical analysis, surface roughness analysis, wave optics simulations

ASJC Scopus subject areas

Cite this

Wave optics simulation of surface roughness for integrated photonics fabricated through multi-photon lithography. / Chatzizyrli, Elisavet; Rittmeier, Alexandra; Böse, Sophie et al.
Integrated Optics: Devices, Materials, and Technologies XXIX. ed. / Sonia M. Garcia-Blanco; Pavel Cheben. SPIE, 2025. 1336913 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 13369).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Chatzizyrli, E, Rittmeier, A, Böse, S, Neumann, J, Kracht, D & Hinkelmann, M 2025, Wave optics simulation of surface roughness for integrated photonics fabricated through multi-photon lithography. in SM Garcia-Blanco & P Cheben (eds), Integrated Optics: Devices, Materials, and Technologies XXIX., 1336913, Proceedings of SPIE - The International Society for Optical Engineering, vol. 13369, SPIE, SPIE Photonics West OPTO 2025, San Francisco, California, United States, 25 Jan 2025. https://doi.org/10.1117/12.3043012
Chatzizyrli, E., Rittmeier, A., Böse, S., Neumann, J., Kracht, D., & Hinkelmann, M. (2025). Wave optics simulation of surface roughness for integrated photonics fabricated through multi-photon lithography. In S. M. Garcia-Blanco, & P. Cheben (Eds.), Integrated Optics: Devices, Materials, and Technologies XXIX Article 1336913 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 13369). SPIE. https://doi.org/10.1117/12.3043012
Chatzizyrli E, Rittmeier A, Böse S, Neumann J, Kracht D, Hinkelmann M. Wave optics simulation of surface roughness for integrated photonics fabricated through multi-photon lithography. In Garcia-Blanco SM, Cheben P, editors, Integrated Optics: Devices, Materials, and Technologies XXIX. SPIE. 2025. 1336913. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.3043012
Chatzizyrli, Elisavet ; Rittmeier, Alexandra ; Böse, Sophie et al. / Wave optics simulation of surface roughness for integrated photonics fabricated through multi-photon lithography. Integrated Optics: Devices, Materials, and Technologies XXIX. editor / Sonia M. Garcia-Blanco ; Pavel Cheben. SPIE, 2025. (Proceedings of SPIE - The International Society for Optical Engineering).
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