Details
Original language | English |
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Title of host publication | Integrated Optics |
Subtitle of host publication | Devices, Materials, and Technologies XXIX |
Editors | Sonia M. Garcia-Blanco, Pavel Cheben |
Publisher | SPIE |
Chapter | 5 |
ISBN (electronic) | 9781510684867 |
Publication status | Published - 19 Mar 2025 |
Event | SPIE Photonics West OPTO 2025 - San Francisco, United States, San Francisco, United States Duration: 25 Jan 2025 → 31 Jan 2025 |
Publication series
Name | Proceedings of SPIE - The International Society for Optical Engineering |
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Volume | 13369 |
ISSN (Print) | 0277-786X |
ISSN (electronic) | 1996-756X |
Abstract
Integrated photonics has the potential to revolutionize telecommunications and computing as electronic circuits approach their physical limits. This study investigates multi-photon lithography (MPL), an innovative method for fabricating photonic integrated circuits, which combines rapid manufacturability with design flexibility but can introduce surface roughness influenced by process parameters. Using ridge waveguides on the photopolymer-on-glass (PoG) platform, surface roughness metrics from laser scanning confocal microscopy (LSCM) and wave optics simulations in ANSYS Lumerical are analyzed. Statistical analysis links process parameters to surface quality, while simulations quantify the impact of roughness on waveguide performance, including scattering-induced losses. This approach facilitates fabrication optimization and enables accurate modeling of 3D-printed photonic components.
Keywords
- integrated photonics, multi-photon lithography, regression analysis, statistical analysis, surface roughness analysis, wave optics simulations
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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- Harvard
- Apa
- Vancouver
- BibTeX
- RIS
Integrated Optics: Devices, Materials, and Technologies XXIX. ed. / Sonia M. Garcia-Blanco; Pavel Cheben. SPIE, 2025. 1336913 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 13369).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Wave optics simulation of surface roughness for integrated photonics fabricated through multi-photon lithography
AU - Chatzizyrli, Elisavet
AU - Rittmeier, Alexandra
AU - Böse, Sophie
AU - Neumann, Jörg
AU - Kracht, Dietmar
AU - Hinkelmann, Moritz
N1 - Publisher Copyright: © 2025 SPIE.
PY - 2025/3/19
Y1 - 2025/3/19
N2 - Integrated photonics has the potential to revolutionize telecommunications and computing as electronic circuits approach their physical limits. This study investigates multi-photon lithography (MPL), an innovative method for fabricating photonic integrated circuits, which combines rapid manufacturability with design flexibility but can introduce surface roughness influenced by process parameters. Using ridge waveguides on the photopolymer-on-glass (PoG) platform, surface roughness metrics from laser scanning confocal microscopy (LSCM) and wave optics simulations in ANSYS Lumerical are analyzed. Statistical analysis links process parameters to surface quality, while simulations quantify the impact of roughness on waveguide performance, including scattering-induced losses. This approach facilitates fabrication optimization and enables accurate modeling of 3D-printed photonic components.
AB - Integrated photonics has the potential to revolutionize telecommunications and computing as electronic circuits approach their physical limits. This study investigates multi-photon lithography (MPL), an innovative method for fabricating photonic integrated circuits, which combines rapid manufacturability with design flexibility but can introduce surface roughness influenced by process parameters. Using ridge waveguides on the photopolymer-on-glass (PoG) platform, surface roughness metrics from laser scanning confocal microscopy (LSCM) and wave optics simulations in ANSYS Lumerical are analyzed. Statistical analysis links process parameters to surface quality, while simulations quantify the impact of roughness on waveguide performance, including scattering-induced losses. This approach facilitates fabrication optimization and enables accurate modeling of 3D-printed photonic components.
KW - integrated photonics
KW - multi-photon lithography
KW - regression analysis
KW - statistical analysis
KW - surface roughness analysis
KW - wave optics simulations
UR - http://www.scopus.com/inward/record.url?scp=105002378762&partnerID=8YFLogxK
U2 - 10.1117/12.3043012
DO - 10.1117/12.3043012
M3 - Conference contribution
AN - SCOPUS:105002378762
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Integrated Optics
A2 - Garcia-Blanco, Sonia M.
A2 - Cheben, Pavel
PB - SPIE
T2 - SPIE Photonics West OPTO 2025
Y2 - 25 January 2025 through 31 January 2025
ER -