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Two-dimensional light force lithography with polarization gradient fields

Research output: Contribution to conference › Paper › Research › peer review

Authors

  • B. Brezger
  • P. O. Schmidt
  • Th Schulze
  • A. Bell

External Research Organisations

  • University of Konstanz

Details

Original languageEnglish
Pages67
Number of pages1
Publication statusPublished - 1998
Externally publishedYes
Event1998 International Quantum Electronics Conference - San Francisco, United States
Duration: 3 May 1998 → 8 May 1998

Conference

Conference1998 International Quantum Electronics Conference
Country/TerritoryUnited States
CitySan Francisco
Period3 May 1998 → 8 May 1998

Abstract

Atoms with a magnetic substructure in the electronic ground state are strongly sensitive to light polarization and static magnetic fields. The applications of the effects in light force lithography are studied namely: the potentials for magnetic substates differ in height even in a light field with uniform polarization leading to an aberration in the focusing process; and introducing polarization gradients into the light mask gives rise to feature separations below half the wavelength. A detailed investigation of possible two-dimensional light field configurations include polarization gradients and static magnetic field.

ASJC Scopus subject areas

Cite this

Two-dimensional light force lithography with polarization gradient fields. / Brezger, B.; Schmidt, P. O.; Schulze, Th et al.
1998. 67 Paper presented at 1998 International Quantum Electronics Conference, San Francisco, California, United States.

Research output: Contribution to conference › Paper › Research › peer review

Brezger, B, Schmidt, PO, Schulze, T, Bell, A, Pfau, T & Mlynek, J 1998, 'Two-dimensional light force lithography with polarization gradient fields', Paper presented at 1998 International Quantum Electronics Conference, San Francisco, United States, 3 May 1998 - 8 May 1998 pp. 67.
Brezger, B., Schmidt, P. O., Schulze, T., Bell, A., Pfau, T., & Mlynek, J. (1998). Two-dimensional light force lithography with polarization gradient fields. 67. Paper presented at 1998 International Quantum Electronics Conference, San Francisco, California, United States.
Brezger B, Schmidt PO, Schulze T, Bell A, Pfau T, Mlynek J. Two-dimensional light force lithography with polarization gradient fields. 1998. Paper presented at 1998 International Quantum Electronics Conference, San Francisco, California, United States.
Brezger, B. ; Schmidt, P. O. ; Schulze, Th et al. / Two-dimensional light force lithography with polarization gradient fields. Paper presented at 1998 International Quantum Electronics Conference, San Francisco, California, United States.1 p.
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