Polarization gradient light masks in atom lithography

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Original languageEnglish
Pages (from-to)148-153
Number of pages6
JournalEurophysics Letters (EPL)
Volume46
Issue number2
Publication statusPublished - 2 Apr 1999
Externally publishedYes

Abstract

In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.

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Cite this

Polarization gradient light masks in atom lithography. / Brezger, B.; Schulze, Th; Schmidt, Piet Oliver et al.
In: Europhysics Letters (EPL), Vol. 46, No. 2, 02.04.1999, p. 148-153.

Research output: Contribution to journalArticleResearchpeer review

Brezger, B, Schulze, T, Schmidt, PO, Mertens, R, Pfau, T & Mlynek, J 1999, 'Polarization gradient light masks in atom lithography', Europhysics Letters (EPL), vol. 46, no. 2, pp. 148-153. https://doi.org/10.1209/epl/i1999-00237-5
Brezger, B., Schulze, T., Schmidt, P. O., Mertens, R., Pfau, T., & Mlynek, J. (1999). Polarization gradient light masks in atom lithography. Europhysics Letters (EPL), 46(2), 148-153. https://doi.org/10.1209/epl/i1999-00237-5
Brezger B, Schulze T, Schmidt PO, Mertens R, Pfau T, Mlynek J. Polarization gradient light masks in atom lithography. Europhysics Letters (EPL). 1999 Apr 2;46(2):148-153. doi: 10.1209/epl/i1999-00237-5
Brezger, B. ; Schulze, Th ; Schmidt, Piet Oliver et al. / Polarization gradient light masks in atom lithography. In: Europhysics Letters (EPL). 1999 ; Vol. 46, No. 2. pp. 148-153.
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