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On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses

Research output: Contribution to journal › Article › Research › peer review

Authors

  • Mark Mero
  • Benjamin Clapp
  • Jayesh C. Jasapara
  • Wolfgang Rudolph
  • Detlev Ristau

External Research Organisations

  • University of New Mexico
  • OFS Laboratories
  • Laser Zentrum Hannover e.V. (LZH)
  • BAM Federal Institute for Materials Research and Testing
  • University of Vienna
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Details

Original languageEnglish
Pages (from-to)1-7
Number of pages7
JournalOptical Engineering
Volume44
Issue number5
Publication statusPublished - 1 May 2005
Externally publishedYes

Abstract

The physical effects reducing the damage threshold of dielectric films when exposed to multiple femtosecond pulses are investigated. The measured temperature increase of a Ta2O5 film scales exponentially with the pulse fluence. A polarized luminescence signal is observed that depends quadratically on the pulse fluence and is attributed to two-photon excitation of self-trapped excitons that form after band-to-band excitation. The damage fluence decreases with increasing pulse number, but is independent of the repetition rate from 1 Hz to 1 kHz at a constant pulse number. The repetition rate dependence of the breakdown threshold is also measured for TiO2, HfO2, Al2O3, and SiO2 films. A theoretical model is presented that explains these findings.

Keywords

    Coatings, Laser materials, Laser-induced damage, Ultrafast phenomena

ASJC Scopus subject areas

Cite this

On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses. / Mero, Mark; Clapp, Benjamin; Jasapara, Jayesh C. et al.
In: Optical Engineering, Vol. 44, No. 5, 01.05.2005, p. 1-7.

Research output: Contribution to journal › Article › Research › peer review

Mero, M, Clapp, B, Jasapara, JC, Rudolph, W, Ristau, D, Starke, K, Krüger, J, Martin, S & Kautek, W 2005, 'On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses', Optical Engineering, vol. 44, no. 5, pp. 1-7. https://doi.org/10.1117/1.1905343
Mero, M., Clapp, B., Jasapara, J. C., Rudolph, W., Ristau, D., Starke, K., Krüger, J., Martin, S., & Kautek, W. (2005). On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses. Optical Engineering, 44(5), 1-7. https://doi.org/10.1117/1.1905343
Mero M, Clapp B, Jasapara JC, Rudolph W, Ristau D, Starke K et al. On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses. Optical Engineering. 2005 May 1;44(5):1-7. doi: 10.1117/1.1905343
Mero, Mark ; Clapp, Benjamin ; Jasapara, Jayesh C. et al. / On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses. In: Optical Engineering. 2005 ; Vol. 44, No. 5. pp. 1-7.
Download
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abstract = "The physical effects reducing the damage threshold of dielectric films when exposed to multiple femtosecond pulses are investigated. The measured temperature increase of a Ta2O5 film scales exponentially with the pulse fluence. A polarized luminescence signal is observed that depends quadratically on the pulse fluence and is attributed to two-photon excitation of self-trapped excitons that form after band-to-band excitation. The damage fluence decreases with increasing pulse number, but is independent of the repetition rate from 1 Hz to 1 kHz at a constant pulse number. The repetition rate dependence of the breakdown threshold is also measured for TiO2, HfO2, Al2O3, and SiO2 films. A theoretical model is presented that explains these findings.",
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