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Multi-photon lithography of strip-loaded thin-film lithium niobate waveguides

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Alexandra Rittmeier
  • Elisavet Chatzizyrli
  • Philipp Gehrke
  • Muhamed A. Sewidan
  • Angeliki Afentaki
  • Gerd A. Hoffmann
  • Dietmar Kracht
  • Michael Kues

External Research Organisations

  • Laser Zentrum Hannover e.V. (LZH)
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Details

Original languageEnglish
Title of host publicationIntegrated Optics
Subtitle of host publicationDevices, Materials, and Technologies XXIX
EditorsSonia M. Garcia-Blanco, Pavel Cheben
PublisherSPIE
ISBN (electronic)9781510684867
Publication statusPublished - 27 Jan 2025
EventIntegrated Optics: Devices, Materials, and Technologies XXIX 2025 - San Francisco, United States
Duration: 27 Jan 202530 Jan 2025

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume13369
ISSN (Print)0277-786X
ISSN (electronic)1996-756X

Abstract

Photonic integrated circuits represent a promising technology for creating compact and cost-effective optical devices with multiple functions on a single chip. The advancement of integrated photonics is driven by research on new material platforms and production techniques. Lithium niobate (LN) is particularly attractive due to its advantageous optical properties like nonlinearity and electro optic effect. Integrated LN waveguides have been historically fabricated using multi-step methods, including lithographic patterning and dry etching. Additive manufacturing, in contrast, allows for rapid single-step production. This paper presents a novel etchless fabrication process using multi-photon lithography to create strip-loaded waveguides on thin-film LN. It demonstrates the reusability of thin-film LN substrates by erasing and reprinting strips, promoting rapid and sustainable photonic chip production. The study includes strip widths between 1 and 5 µm and thin-film layer thicknesses of 300, 600 and 900 nm, with experimental data supported by numerical simulations. We report propagation losses below 1 dB/cm at 1550 nm. Additionally, advantages and disadvantages of different strip-loaded LN waveguide designs for photonic packaging, e.g. higher coupling losses for smaller LN layer thickness, are discussed.

Keywords

    additive manufacturing, Lithium niobate, Multi-photon lithography, photonic integrated chip, strip-loaded waveguide, TFLN, Two-photon polymerization

ASJC Scopus subject areas

Cite this

Multi-photon lithography of strip-loaded thin-film lithium niobate waveguides. / Rittmeier, Alexandra; Chatzizyrli, Elisavet; Gehrke, Philipp et al.
Integrated Optics: Devices, Materials, and Technologies XXIX. ed. / Sonia M. Garcia-Blanco; Pavel Cheben. SPIE, 2025. 1336914 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 13369).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Rittmeier, A, Chatzizyrli, E, Gehrke, P, Sewidan, MA, Braun, M, Afentaki, A, Hoffmann, GA, Neumann, J, Wienke, A, Kracht, D, Kues, M & Hinkelmann, M 2025, Multi-photon lithography of strip-loaded thin-film lithium niobate waveguides. in SM Garcia-Blanco & P Cheben (eds), Integrated Optics: Devices, Materials, and Technologies XXIX., 1336914, Proceedings of SPIE - The International Society for Optical Engineering, vol. 13369, SPIE, Integrated Optics, San Francisco, California, United States, 27 Jan 2025. https://doi.org/10.1117/12.3043025
Rittmeier, A., Chatzizyrli, E., Gehrke, P., Sewidan, M. A., Braun, M., Afentaki, A., Hoffmann, G. A., Neumann, J., Wienke, A., Kracht, D., Kues, M., & Hinkelmann, M. (2025). Multi-photon lithography of strip-loaded thin-film lithium niobate waveguides. In S. M. Garcia-Blanco, & P. Cheben (Eds.), Integrated Optics: Devices, Materials, and Technologies XXIX Article 1336914 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 13369). SPIE. https://doi.org/10.1117/12.3043025
Rittmeier A, Chatzizyrli E, Gehrke P, Sewidan MA, Braun M, Afentaki A et al. Multi-photon lithography of strip-loaded thin-film lithium niobate waveguides. In Garcia-Blanco SM, Cheben P, editors, Integrated Optics: Devices, Materials, and Technologies XXIX. SPIE. 2025. 1336914. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.3043025
Rittmeier, Alexandra ; Chatzizyrli, Elisavet ; Gehrke, Philipp et al. / Multi-photon lithography of strip-loaded thin-film lithium niobate waveguides. Integrated Optics: Devices, Materials, and Technologies XXIX. editor / Sonia M. Garcia-Blanco ; Pavel Cheben. SPIE, 2025. (Proceedings of SPIE - The International Society for Optical Engineering).
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abstract = "Photonic integrated circuits represent a promising technology for creating compact and cost-effective optical devices with multiple functions on a single chip. The advancement of integrated photonics is driven by research on new material platforms and production techniques. Lithium niobate (LN) is particularly attractive due to its advantageous optical properties like nonlinearity and electro optic effect. Integrated LN waveguides have been historically fabricated using multi-step methods, including lithographic patterning and dry etching. Additive manufacturing, in contrast, allows for rapid single-step production. This paper presents a novel etchless fabrication process using multi-photon lithography to create strip-loaded waveguides on thin-film LN. It demonstrates the reusability of thin-film LN substrates by erasing and reprinting strips, promoting rapid and sustainable photonic chip production. The study includes strip widths between 1 and 5 µm and thin-film layer thicknesses of 300, 600 and 900 nm, with experimental data supported by numerical simulations. We report propagation losses below 1 dB/cm at 1550 nm. Additionally, advantages and disadvantages of different strip-loaded LN waveguide designs for photonic packaging, e.g. higher coupling losses for smaller LN layer thickness, are discussed.",
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T1 - Multi-photon lithography of strip-loaded thin-film lithium niobate waveguides

AU - Rittmeier, Alexandra

AU - Chatzizyrli, Elisavet

AU - Gehrke, Philipp

AU - Sewidan, Muhamed A.

AU - Braun, Martin

AU - Afentaki, Angeliki

AU - Hoffmann, Gerd A.

AU - Neumann, Jörg

AU - Wienke, Andreas

AU - Kracht, Dietmar

AU - Kues, Michael

AU - Hinkelmann, Moritz

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Y1 - 2025/1/27

N2 - Photonic integrated circuits represent a promising technology for creating compact and cost-effective optical devices with multiple functions on a single chip. The advancement of integrated photonics is driven by research on new material platforms and production techniques. Lithium niobate (LN) is particularly attractive due to its advantageous optical properties like nonlinearity and electro optic effect. Integrated LN waveguides have been historically fabricated using multi-step methods, including lithographic patterning and dry etching. Additive manufacturing, in contrast, allows for rapid single-step production. This paper presents a novel etchless fabrication process using multi-photon lithography to create strip-loaded waveguides on thin-film LN. It demonstrates the reusability of thin-film LN substrates by erasing and reprinting strips, promoting rapid and sustainable photonic chip production. The study includes strip widths between 1 and 5 µm and thin-film layer thicknesses of 300, 600 and 900 nm, with experimental data supported by numerical simulations. We report propagation losses below 1 dB/cm at 1550 nm. Additionally, advantages and disadvantages of different strip-loaded LN waveguide designs for photonic packaging, e.g. higher coupling losses for smaller LN layer thickness, are discussed.

AB - Photonic integrated circuits represent a promising technology for creating compact and cost-effective optical devices with multiple functions on a single chip. The advancement of integrated photonics is driven by research on new material platforms and production techniques. Lithium niobate (LN) is particularly attractive due to its advantageous optical properties like nonlinearity and electro optic effect. Integrated LN waveguides have been historically fabricated using multi-step methods, including lithographic patterning and dry etching. Additive manufacturing, in contrast, allows for rapid single-step production. This paper presents a novel etchless fabrication process using multi-photon lithography to create strip-loaded waveguides on thin-film LN. It demonstrates the reusability of thin-film LN substrates by erasing and reprinting strips, promoting rapid and sustainable photonic chip production. The study includes strip widths between 1 and 5 µm and thin-film layer thicknesses of 300, 600 and 900 nm, with experimental data supported by numerical simulations. We report propagation losses below 1 dB/cm at 1550 nm. Additionally, advantages and disadvantages of different strip-loaded LN waveguide designs for photonic packaging, e.g. higher coupling losses for smaller LN layer thickness, are discussed.

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KW - Lithium niobate

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By the same author(s)