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Modelling and numerical simulation of the infrared photoablation process

Research output: Contribution to journalConference articleResearchpeer review

Authors

  • A. Olmes
  • M. Brand
  • M. Raible
  • H. Lubatschowski
  • W. Ertmer

Research Organisations

Details

Original languageEnglish
Pages (from-to)208-219
Number of pages12
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3195
Publication statusPublished - 14 Jan 1998
Event1997 Lasers-Tissue Interaction, Tissue Optics and Laser Welding III - San Remo, Italy
Duration: 5 Sept 19978 Sept 1997

Abstract

Photoablative tissue processing at the wavelength λ ≈ 3μm is of great interest in many medical applications but not yet really understood. A mathematical model of the photoablation process using a free-running infrared laser has been developed. It includes evaporation and thermoelastie pressure generation and was solved using the Finite-Element-Method. Simulated thermoelastic pressure transients are in good agreement with the experiment. It has been shown, that the temperature dependence of the absorption and the volumetric expansion cannot be neglected. With higher laser intensities strong recoil pressure transients (≥ 100bar) and strong thermoelastic pressure transients due to a partially evaporation are given. For this reason a new model including large tissue expansions, tissue overheating and recoil induced pressure transients has been developed and presented. This work is supported by the Deutsche Forschungsgemeinschaft.

Keywords

    Absorption, Finite element method, Infrared, Photoablation, Soft tissue, Temperature, Theoretical

ASJC Scopus subject areas

Cite this

Modelling and numerical simulation of the infrared photoablation process. / Olmes, A.; Brand, M.; Raible, M. et al.
In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 3195, 14.01.1998, p. 208-219.

Research output: Contribution to journalConference articleResearchpeer review

Olmes, A, Brand, M, Raible, M, Lubatschowski, H, Ertmer, W, Bänsch, E, Dziuk, G & Lubatschowski, H 1998, 'Modelling and numerical simulation of the infrared photoablation process', Proceedings of SPIE - The International Society for Optical Engineering, vol. 3195, pp. 208-219. https://doi.org/10.1117/12.297904
Olmes, A., Brand, M., Raible, M., Lubatschowski, H., Ertmer, W., Bänsch, E., Dziuk, G., & Lubatschowski, H. (1998). Modelling and numerical simulation of the infrared photoablation process. Proceedings of SPIE - The International Society for Optical Engineering, 3195, 208-219. https://doi.org/10.1117/12.297904
Olmes A, Brand M, Raible M, Lubatschowski H, Ertmer W, Bänsch E et al. Modelling and numerical simulation of the infrared photoablation process. Proceedings of SPIE - The International Society for Optical Engineering. 1998 Jan 14;3195:208-219. doi: 10.1117/12.297904
Olmes, A. ; Brand, M. ; Raible, M. et al. / Modelling and numerical simulation of the infrared photoablation process. In: Proceedings of SPIE - The International Society for Optical Engineering. 1998 ; Vol. 3195. pp. 208-219.
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