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Materials science in semiconductor processing

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Publications

  1. 2018

  2. Published

    Application of a novel triple metal-nonmetal doped TiO2 (K-B-N-TiO2) for photocatalytic degradation of Linear Alkyl Benzene (LAB) industrial wastewater under visible light

    Zangeneh, H., Zinatizadeh, A. A., Feyzi, M., Zinadini, S. & Bahnemann, D. W., 1 Mar 2018, In: Materials Science in Semiconductor Processing. 75, p. 193-205 13 p.

    Research output: Contribution to journal › Article › Research › peer review

  3. 2006

  4. Published

    Residual strain in Ge films grown by surfactant-mediated epitaxy on Si(1 1 1) and Si(0 0 1) substrates

    Wietler, T. F., Bugiel, E. & Hofmann, K. R., Aug 2006, In: Materials Science in Semiconductor Processing. 9, 4-5 SPEC. ISS., p. 659-663 5 p.

    Research output: Contribution to journal › Article › Research › peer review

  5. 2005

  6. Published

    Advances in surfactant-mediated growth of germanium on silicon: High-quality p-type Ge films on Si

    Wietler, T. F., Ott, A., Bugiel, E. & Hofmann, K. R., Feb 2005, In: Materials Science in Semiconductor Processing. 8, 1-3 SPEC. ISS., p. 73-77 5 p.

    Research output: Contribution to journal › Article › Research › peer review

  7. 2003

  8. Published

    Static and dynamic analysis of failure locations and void formation in interconnects due to various migration mechanisms

    Weide-Zaage, K., Dalleau, D. & Yu, X., Feb 2003, In: Materials Science in Semiconductor Processing. 6, 1-3, p. 85-92 8 p.

    Research output: Contribution to journal › Article › Research › peer review