Influence of nanostructure formation on the crystal structure and morphology of epitaxially grown Gd 2 O 3 on Si(001)

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • Philipp Gribisch
  • Jan Schmidt
  • Hans Jörg Osten
  • Andreas Fissel
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Details

OriginalspracheEnglisch
Seiten (von - bis)59-70
Seitenumfang12
FachzeitschriftActa Crystallographica Section B: Structural Science, Crystal Engineering and Materials
Jahrgang75
Ausgabenummer1
Frühes Online-Datum23 Jan. 2019
PublikationsstatusVeröffentlicht - Feb. 2019

Abstract

The influence of growth conditions on the layer orientation, domain structure and crystal structure of gadolinium oxide (Gd 2 O 3 ) on silicon (001) has been investigated. Gd 2 O 3 was grown at low (250°C) and high (850°C) temperatures with different oxygen partial pressure as well as a temperature ramp up during growth. At low temperature, the cubic bixbyite type of crystal structure with space group was grown at low oxygen partial pressure. The layers consist of two domains oriented orthogonal to each other. The epitaxial relationships for the two domains were found to be Gd 2 O 3 (110)[]||Si(001)[110] and Gd 2 O 3 (110)[001]||Si(001)[], respectively. Applying additional oxygen during growth results in a change in crystal and domain structures of the grown layer into the monoclinic Sm 2 O 3 -type of structure with space group C2/m with () orientation and mainly two orthogonal domains with the epitaxial relationship Gd 2 O 3 ()[010]||Si(100)⟨110⟩ and a smooth surface morphology. Some smaller areas have two intermediate azimuthal orientations between these variants, which results in a six-domain structure. The change in crystal structure can be understood based on the Gibbs–Thomson effect caused by the initial nucleation of nanometre-sized islands and its variation in diameter with a change in growth conditions. The crystal structure remains stable even against a temperature ramp up during growth. The layers grown at high temperature exhibit a nanowire-like surface morphology, where the nanowires have a cubic crystal structure and are aligned orthogonal to each other along the ⟨110⟩ in-plane directions. An increase in oxygen supply results in a reduced length and increased number of nanowires due to lower adatom mobility. The results clearly indicate that both kinetic and thermodynamic factors have a strong impact on the crystal structure, epitaxial relationship and morphology of the grown layers.

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Influence of nanostructure formation on the crystal structure and morphology of epitaxially grown Gd 2 O 3 on Si(001). / Gribisch, Philipp; Schmidt, Jan; Osten, Hans Jörg et al.
in: Acta Crystallographica Section B: Structural Science, Crystal Engineering and Materials, Jahrgang 75, Nr. 1, 02.2019, S. 59-70.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

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@article{9bd08bf2e6fb478db9e68928b454b20b,
title = "Influence of nanostructure formation on the crystal structure and morphology of epitaxially grown Gd 2 O 3 on Si(001)",
abstract = " The influence of growth conditions on the layer orientation, domain structure and crystal structure of gadolinium oxide (Gd 2 O 3 ) on silicon (001) has been investigated. Gd 2 O 3 was grown at low (250°C) and high (850°C) temperatures with different oxygen partial pressure as well as a temperature ramp up during growth. At low temperature, the cubic bixbyite type of crystal structure with space group was grown at low oxygen partial pressure. The layers consist of two domains oriented orthogonal to each other. The epitaxial relationships for the two domains were found to be Gd 2 O 3 (110)[]||Si(001)[110] and Gd 2 O 3 (110)[001]||Si(001)[], respectively. Applying additional oxygen during growth results in a change in crystal and domain structures of the grown layer into the monoclinic Sm 2 O 3 -type of structure with space group C2/m with () orientation and mainly two orthogonal domains with the epitaxial relationship Gd 2 O 3 ()[010]||Si(100)⟨110⟩ and a smooth surface morphology. Some smaller areas have two intermediate azimuthal orientations between these variants, which results in a six-domain structure. The change in crystal structure can be understood based on the Gibbs–Thomson effect caused by the initial nucleation of nanometre-sized islands and its variation in diameter with a change in growth conditions. The crystal structure remains stable even against a temperature ramp up during growth. The layers grown at high temperature exhibit a nanowire-like surface morphology, where the nanowires have a cubic crystal structure and are aligned orthogonal to each other along the ⟨110⟩ in-plane directions. An increase in oxygen supply results in a reduced length and increased number of nanowires due to lower adatom mobility. The results clearly indicate that both kinetic and thermodynamic factors have a strong impact on the crystal structure, epitaxial relationship and morphology of the grown layers. ",
keywords = "molecular beam epitaxy, nanostructures, polymorphism, rare-earth oxides, surface morphology, X-ray diffraction",
author = "Philipp Gribisch and Jan Schmidt and Osten, {Hans J{\"o}rg} and Andreas Fissel",
note = "Funding information: The following funding is acknowledged: Minna-James-Heineman foundation (scholarship to Philipp Gribisch).",
year = "2019",
month = feb,
doi = "10.1107/S2052520618017869",
language = "English",
volume = "75",
pages = "59--70",
journal = "Acta Crystallographica Section B: Structural Science, Crystal Engineering and Materials",
issn = "2052-5192",
publisher = "International Union of Crystallography",
number = "1",

}

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TY - JOUR

T1 - Influence of nanostructure formation on the crystal structure and morphology of epitaxially grown Gd 2 O 3 on Si(001)

AU - Gribisch, Philipp

AU - Schmidt, Jan

AU - Osten, Hans Jörg

AU - Fissel, Andreas

N1 - Funding information: The following funding is acknowledged: Minna-James-Heineman foundation (scholarship to Philipp Gribisch).

PY - 2019/2

Y1 - 2019/2

N2 - The influence of growth conditions on the layer orientation, domain structure and crystal structure of gadolinium oxide (Gd 2 O 3 ) on silicon (001) has been investigated. Gd 2 O 3 was grown at low (250°C) and high (850°C) temperatures with different oxygen partial pressure as well as a temperature ramp up during growth. At low temperature, the cubic bixbyite type of crystal structure with space group was grown at low oxygen partial pressure. The layers consist of two domains oriented orthogonal to each other. The epitaxial relationships for the two domains were found to be Gd 2 O 3 (110)[]||Si(001)[110] and Gd 2 O 3 (110)[001]||Si(001)[], respectively. Applying additional oxygen during growth results in a change in crystal and domain structures of the grown layer into the monoclinic Sm 2 O 3 -type of structure with space group C2/m with () orientation and mainly two orthogonal domains with the epitaxial relationship Gd 2 O 3 ()[010]||Si(100)⟨110⟩ and a smooth surface morphology. Some smaller areas have two intermediate azimuthal orientations between these variants, which results in a six-domain structure. The change in crystal structure can be understood based on the Gibbs–Thomson effect caused by the initial nucleation of nanometre-sized islands and its variation in diameter with a change in growth conditions. The crystal structure remains stable even against a temperature ramp up during growth. The layers grown at high temperature exhibit a nanowire-like surface morphology, where the nanowires have a cubic crystal structure and are aligned orthogonal to each other along the ⟨110⟩ in-plane directions. An increase in oxygen supply results in a reduced length and increased number of nanowires due to lower adatom mobility. The results clearly indicate that both kinetic and thermodynamic factors have a strong impact on the crystal structure, epitaxial relationship and morphology of the grown layers.

AB - The influence of growth conditions on the layer orientation, domain structure and crystal structure of gadolinium oxide (Gd 2 O 3 ) on silicon (001) has been investigated. Gd 2 O 3 was grown at low (250°C) and high (850°C) temperatures with different oxygen partial pressure as well as a temperature ramp up during growth. At low temperature, the cubic bixbyite type of crystal structure with space group was grown at low oxygen partial pressure. The layers consist of two domains oriented orthogonal to each other. The epitaxial relationships for the two domains were found to be Gd 2 O 3 (110)[]||Si(001)[110] and Gd 2 O 3 (110)[001]||Si(001)[], respectively. Applying additional oxygen during growth results in a change in crystal and domain structures of the grown layer into the monoclinic Sm 2 O 3 -type of structure with space group C2/m with () orientation and mainly two orthogonal domains with the epitaxial relationship Gd 2 O 3 ()[010]||Si(100)⟨110⟩ and a smooth surface morphology. Some smaller areas have two intermediate azimuthal orientations between these variants, which results in a six-domain structure. The change in crystal structure can be understood based on the Gibbs–Thomson effect caused by the initial nucleation of nanometre-sized islands and its variation in diameter with a change in growth conditions. The crystal structure remains stable even against a temperature ramp up during growth. The layers grown at high temperature exhibit a nanowire-like surface morphology, where the nanowires have a cubic crystal structure and are aligned orthogonal to each other along the ⟨110⟩ in-plane directions. An increase in oxygen supply results in a reduced length and increased number of nanowires due to lower adatom mobility. The results clearly indicate that both kinetic and thermodynamic factors have a strong impact on the crystal structure, epitaxial relationship and morphology of the grown layers.

KW - molecular beam epitaxy

KW - nanostructures

KW - polymorphism

KW - rare-earth oxides

KW - surface morphology

KW - X-ray diffraction

UR - http://www.scopus.com/inward/record.url?scp=85061321574&partnerID=8YFLogxK

U2 - 10.1107/S2052520618017869

DO - 10.1107/S2052520618017869

M3 - Article

C2 - 32830779

AN - SCOPUS:85061321574

VL - 75

SP - 59

EP - 70

JO - Acta Crystallographica Section B: Structural Science, Crystal Engineering and Materials

JF - Acta Crystallographica Section B: Structural Science, Crystal Engineering and Materials

SN - 2052-5192

IS - 1

ER -