Imaging of oxide precipitates in silicon with ballistic phonons

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • W. Metzger
  • R. P. Huebener
  • R. J. Haug
  • H. U. Habermeier

Externe Organisationen

  • Eberhard Karls Universität Tübingen
  • Max-Planck-Institut für Festkörperforschung
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Details

OriginalspracheEnglisch
Seiten (von - bis)1051-1053
Seitenumfang3
FachzeitschriftApplied physics letters
Jahrgang47
Ausgabenummer10
PublikationsstatusVeröffentlicht - 1 Dez. 1985
Extern publiziertJa

Abstract

Ballistic phonons were generated at low temperatures in nearly single-crystalline silicon by scanning the specimen surface with an electron beam. At the opposite sample surface the ballistic phonons were detected with two small-area bolometers placed at different locations. For a Si specimen which had been annealed for 150 h at 1050°C, the ballistic phonon image contained fine structure which could be attributed to oxide precipitates. Comparing the phonon images obtained with the two bolometers, we concluded that the structural inhomogeneities affecting the ballistic phonon propagation were located far from the specimen surface scanned by the electron beam. With these experiments a new principle of three-dimensional tomography based on ballistic phonons has been demonstrated.

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Imaging of oxide precipitates in silicon with ballistic phonons. / Metzger, W.; Huebener, R. P.; Haug, R. J. et al.
in: Applied physics letters, Jahrgang 47, Nr. 10, 01.12.1985, S. 1051-1053.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Metzger W, Huebener RP, Haug RJ, Habermeier HU. Imaging of oxide precipitates in silicon with ballistic phonons. Applied physics letters. 1985 Dez 1;47(10):1051-1053. doi: 10.1063/1.96375
Metzger, W. ; Huebener, R. P. ; Haug, R. J. et al. / Imaging of oxide precipitates in silicon with ballistic phonons. in: Applied physics letters. 1985 ; Jahrgang 47, Nr. 10. S. 1051-1053.
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