Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI |
| Herausgeber/-innen | Georg von Freymann, Eva Blasco, Debashis Chanda |
| Herausgeber (Verlag) | SPIE |
| ISBN (elektronisch) | 9781510659711 |
| Publikationsstatus | Veröffentlicht - 15 März 2023 |
| Veranstaltung | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI 2023 - San Francisco, USA / Vereinigte Staaten Dauer: 28 Jan. 2023 → 3 Feb. 2023 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Band | 12433 |
| ISSN (Print) | 0277-786X |
| ISSN (elektronisch) | 1996-756X |
Abstract
The demand on the miniaturization of products has fostered the advancement of high-resolution fabrication technologies. Here, we demonstrate a simple and low-cost UV-LED-based lithography technique for structuring at micro- and nanoscale. The corresponding experimental setup was established with off-the-shelf components and allows for single structuring within seconds based on a standard microscope projection photolithography (MPP) process. By improving the printing quality of the structure pattern on transparent foil and employing aberration-corrected optical elements in the systems, high-quality waveguides and gratings at the micro- and nanoscale were successfully fabricated. Especially, minimum feature sizes down to 80 nm using a 100x microscope objective with NA of 1.4 were obtained. This operation-friendly, highly efficient and low-cost approach exhibits great potential in micro- and nanomanufacturing for applications in fields such as nanophotonics, integrated photonics, and micro- and nanoelectromechanical systems.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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- BibTex
- RIS
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI. Hrsg. / Georg von Freymann; Eva Blasco; Debashis Chanda. SPIE, 2023. 124330B (Proceedings of SPIE - The International Society for Optical Engineering; Band 12433).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - Sub-100 nm feature sizes realized by cost-effective microscope projection photolithography
AU - Zheng, Lei
AU - Reinhardt, Carsten
AU - Roth, Bernhard
N1 - Funding Information: The authors acknowledge the financial support from the German Research Foundation (DFG) under Germany’s Excellence Strategy within the Cluster of Excellence PhoenixD (EXC 2122, Project ID 390833453).
PY - 2023/3/15
Y1 - 2023/3/15
N2 - The demand on the miniaturization of products has fostered the advancement of high-resolution fabrication technologies. Here, we demonstrate a simple and low-cost UV-LED-based lithography technique for structuring at micro- and nanoscale. The corresponding experimental setup was established with off-the-shelf components and allows for single structuring within seconds based on a standard microscope projection photolithography (MPP) process. By improving the printing quality of the structure pattern on transparent foil and employing aberration-corrected optical elements in the systems, high-quality waveguides and gratings at the micro- and nanoscale were successfully fabricated. Especially, minimum feature sizes down to 80 nm using a 100x microscope objective with NA of 1.4 were obtained. This operation-friendly, highly efficient and low-cost approach exhibits great potential in micro- and nanomanufacturing for applications in fields such as nanophotonics, integrated photonics, and micro- and nanoelectromechanical systems.
AB - The demand on the miniaturization of products has fostered the advancement of high-resolution fabrication technologies. Here, we demonstrate a simple and low-cost UV-LED-based lithography technique for structuring at micro- and nanoscale. The corresponding experimental setup was established with off-the-shelf components and allows for single structuring within seconds based on a standard microscope projection photolithography (MPP) process. By improving the printing quality of the structure pattern on transparent foil and employing aberration-corrected optical elements in the systems, high-quality waveguides and gratings at the micro- and nanoscale were successfully fabricated. Especially, minimum feature sizes down to 80 nm using a 100x microscope objective with NA of 1.4 were obtained. This operation-friendly, highly efficient and low-cost approach exhibits great potential in micro- and nanomanufacturing for applications in fields such as nanophotonics, integrated photonics, and micro- and nanoelectromechanical systems.
KW - high-resolution structuring
KW - microscope projection photolithography
KW - nanofabrication
KW - sub-100 nm
UR - http://www.scopus.com/inward/record.url?scp=85159788336&partnerID=8YFLogxK
U2 - 10.1117/12.2648032
DO - 10.1117/12.2648032
M3 - Conference contribution
AN - SCOPUS:85159788336
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI
A2 - von Freymann, Georg
A2 - Blasco, Eva
A2 - Chanda, Debashis
PB - SPIE
T2 - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI 2023
Y2 - 28 January 2023 through 3 February 2023
ER -