Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • Wjatscheslaw Sakiew
  • Stefan Schrameyer
  • Marco Jupé
  • Philippe Schwerdtner
  • Nick Erhart
  • Kai Starke
  • Detlev Ristau

Externe Organisationen

  • Cutting Edge Coatings GmbH
  • Laser Zentrum Hannover e.V. (LZH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Seiten (von - bis)109-120
Seitenumfang12
FachzeitschriftThin Solid Films
Jahrgang682
PublikationsstatusVeröffentlicht - 10 Mai 2019
Extern publiziertJa

Abstract

In the present study, the influence of different ion beam parameters onto the two-dimensional thickness distribution of optical coatings in an industrial scale coating process is investigated. Ta2O5 and TiO2 films were deposited by reactive ion beam sputtering under variation of ion species, ion beam current, ion energy and beamlet pattern of the applied ion optic. Also the distance between ion optic and target was varied. The corresponding thickness distributions over a planar area of 0.9 × 1.0 m2 were determined by the collection method and characterized with respect to maximum deposition rate, distribution width and deposition volume rate as a measure of productivity. To interpolate the discrete mapping data accurately, an empirical model function was determined. Concerning the ion beam current it has been verified that the maximum deposition rate and the deposition volume rate scale identically and directly proportional to the ion beam current. The normalized distribution itself is almost independent of the varied beam parameters. Furthermore, it has been found that the ion energies of 1.5 and 2.0 keV have no significant impact on the material distribution. In contrast, it was observed that the ion species and the distance between the ion optic and the target affect the productivity significantly.

ASJC Scopus Sachgebiete

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Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering. / Sakiew, Wjatscheslaw; Schrameyer, Stefan; Jupé, Marco et al.
in: Thin Solid Films, Jahrgang 682, 10.05.2019, S. 109-120.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Sakiew W, Schrameyer S, Jupé M, Schwerdtner P, Erhart N, Starke K et al. Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering. Thin Solid Films. 2019 Mai 10;682:109-120. doi: 10.1016/j.tsf.2019.05.027
Sakiew, Wjatscheslaw ; Schrameyer, Stefan ; Jupé, Marco et al. / Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering. in: Thin Solid Films. 2019 ; Jahrgang 682. S. 109-120.
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title = "Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering",
abstract = "In the present study, the influence of different ion beam parameters onto the two-dimensional thickness distribution of optical coatings in an industrial scale coating process is investigated. Ta2O5 and TiO2 films were deposited by reactive ion beam sputtering under variation of ion species, ion beam current, ion energy and beamlet pattern of the applied ion optic. Also the distance between ion optic and target was varied. The corresponding thickness distributions over a planar area of 0.9 × 1.0 m2 were determined by the collection method and characterized with respect to maximum deposition rate, distribution width and deposition volume rate as a measure of productivity. To interpolate the discrete mapping data accurately, an empirical model function was determined. Concerning the ion beam current it has been verified that the maximum deposition rate and the deposition volume rate scale identically and directly proportional to the ion beam current. The normalized distribution itself is almost independent of the varied beam parameters. Furthermore, it has been found that the ion energies of 1.5 and 2.0 keV have no significant impact on the material distribution. In contrast, it was observed that the ion species and the distance between the ion optic and the target affect the productivity significantly.",
keywords = "Broad ion beam, Industrial scale coating process, Ion beam sputter deposition, Optical coatings, Tantalum pentoxide, Thickness distribution, Titanium dioxide",
author = "Wjatscheslaw Sakiew and Stefan Schrameyer and Marco Jup{\'e} and Philippe Schwerdtner and Nick Erhart and Kai Starke and Detlev Ristau",
note = "Funding information: The authors are grateful to the German Federal Ministry of Education and Research (Bundesministerium f{\"u}r Bildung und Forschung, BMBF) for the financial support of the research project PluTO plus (contract no. 13N13207). Furthermore, the authors want to thank Dr. Benjamin Lotz (GIESS GmbH) for preparation of an ion optic with an elliptical shaped beamlet pattern and the authors want to thank the referees for valuable comments on the manuscript.",
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AU - Sakiew, Wjatscheslaw

AU - Schrameyer, Stefan

AU - Jupé, Marco

AU - Schwerdtner, Philippe

AU - Erhart, Nick

AU - Starke, Kai

AU - Ristau, Detlev

N1 - Funding information: The authors are grateful to the German Federal Ministry of Education and Research (Bundesministerium für Bildung und Forschung, BMBF) for the financial support of the research project PluTO plus (contract no. 13N13207). Furthermore, the authors want to thank Dr. Benjamin Lotz (GIESS GmbH) for preparation of an ion optic with an elliptical shaped beamlet pattern and the authors want to thank the referees for valuable comments on the manuscript.

PY - 2019/5/10

Y1 - 2019/5/10

N2 - In the present study, the influence of different ion beam parameters onto the two-dimensional thickness distribution of optical coatings in an industrial scale coating process is investigated. Ta2O5 and TiO2 films were deposited by reactive ion beam sputtering under variation of ion species, ion beam current, ion energy and beamlet pattern of the applied ion optic. Also the distance between ion optic and target was varied. The corresponding thickness distributions over a planar area of 0.9 × 1.0 m2 were determined by the collection method and characterized with respect to maximum deposition rate, distribution width and deposition volume rate as a measure of productivity. To interpolate the discrete mapping data accurately, an empirical model function was determined. Concerning the ion beam current it has been verified that the maximum deposition rate and the deposition volume rate scale identically and directly proportional to the ion beam current. The normalized distribution itself is almost independent of the varied beam parameters. Furthermore, it has been found that the ion energies of 1.5 and 2.0 keV have no significant impact on the material distribution. In contrast, it was observed that the ion species and the distance between the ion optic and the target affect the productivity significantly.

AB - In the present study, the influence of different ion beam parameters onto the two-dimensional thickness distribution of optical coatings in an industrial scale coating process is investigated. Ta2O5 and TiO2 films were deposited by reactive ion beam sputtering under variation of ion species, ion beam current, ion energy and beamlet pattern of the applied ion optic. Also the distance between ion optic and target was varied. The corresponding thickness distributions over a planar area of 0.9 × 1.0 m2 were determined by the collection method and characterized with respect to maximum deposition rate, distribution width and deposition volume rate as a measure of productivity. To interpolate the discrete mapping data accurately, an empirical model function was determined. Concerning the ion beam current it has been verified that the maximum deposition rate and the deposition volume rate scale identically and directly proportional to the ion beam current. The normalized distribution itself is almost independent of the varied beam parameters. Furthermore, it has been found that the ion energies of 1.5 and 2.0 keV have no significant impact on the material distribution. In contrast, it was observed that the ion species and the distance between the ion optic and the target affect the productivity significantly.

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KW - Optical coatings

KW - Tantalum pentoxide

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